39201023 ----- Polyethylene film, of a thickness of 20?micrometres or more but not exceeding 40?micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
72222011 ---- 2,5?% or more of nickel
02101960 ----- Fore-ends and cuts thereof
44119310 --- Not mechanically worked or surface covered
56013000 - Textile flock and dust and mill neps
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